Patent Number:
6,165,413
Title:
Method of making high density sputtering targets
Abstract:
There is provided a method for fabricating high density sputter targets by pre-packing a powder bed by hot pressing or vibration between metal plates, followed by hot isostatic pressing. This method is especially suitable for preparing sputter targets with a radius to thickness ratio of at least 3 and a density of at least 96% of theoretical.
Inventors:
Lo; Chi-Fung (Fort Lee, NJ), Draper; Darryl (Congers, NY), Gilman; Paul S. (Suffern, NY)
Assignee:
Praxair S.T. Technology, Inc.
International Classification:
B22F 3/15 (20060101); B22F 3/14 (20060101); C23C 14/34 (20060101); B22F 003/15 ()
Expiration Date:
12/26/2017
