Patent Number: 6,165,554

Title: Method for hydrogen atom assisted jet vapor deposition for parylene N and other polymeric thin films

Abstract: A method is presented for the vapor deposition of a material film upon a substrate. The method comprises the use of a Jet Vapor Deposition process with a vaporized polymer gas flowing at supersonic velocity. The vaporized polymer gas consists of a carrier gas and a vaporized polymer, such as Parylene. The vaporized polymer gas impinges upon the substrate through a port and forms the material film.

Inventors: Halpern; Bret (Bethany, CT), Graves; Raymond F. (Milford, CT)

Assignee: Jet Process Corporation

International Classification: B05D 7/24 (20060101); C23C 16/448 (20060101); C23C 16/452 (20060101); B05D 1/02 (20060101); C23C 16/44 (20060101); C23C 016/00 ()

Expiration Date: 12/26/2017