Patent Number: 6,165,656

Title: Overlay error determination mark considering influence of aberration

Abstract: An aberration estimation reticle is provided with a plurality of units spaced from each other. The unit is provided with a first determination mark having a square planar configuration, and a second determination mark located in the first determination mark and including a plurality of holes arranged along a square. These structures provide an overlay error determination reticle and a method of determining an overlay error with the reticle taking an influence by aberration into consideration.

Inventors: Tomimatu; Yoshikatu (Hyogo, JP)

Assignee: Mitsubishi Denki Kabushiki Kaisha

International Classification: G03F 7/20 (20060101); G03F 009/00 ()

Expiration Date: 12/26/2017