Patent Number: 6,165,672

Title: Maleimide or alicyclic olefin-based monomers, copolymer resin of these monomers and photoresist using the resin

Abstract: The present invention relates to a novel maleimide- or alicyclic olefin-based monomer, a copolymer resin of these monomers and a photoresist using the copolymer resin. The maleimide-introduced copolymer resin according to the present invention can easily be copolymerized with alicyclic olefin unit, has a physical property capable of enduring in 2.38% TMAH developer and increases adhesion of ArF or KrF photoresist. The photoresist film using a copolymer resin according to the present invention can be applied to highly integrate semiconductor devices.

Inventors: Jung; Jae Chang (Ichon, KR), Kong; Keun Kyu (Ichon, KR), Bok; Cheol Kyu (Ichon, KR), Baik; Ki Ho (Ichon, KR)

Assignee: Hyundai Electronics Industries Co., Ltd.

International Classification: C07D 207/452 (20060101); C07D 207/00 (20060101); C08F 222/40 (20060101); C08F 222/00 (20060101); C08F 232/00 (20060101); C08F 232/04 (20060101); G03F 7/039 (20060101); G03F 7/004 (20060101); G03C 001/73 (); G03F 007/004 (); C08L 035/00 (); C08L 045/00 (); H01L 029/12 ()

Expiration Date: 12/26/2017