Patent Number: 6,165,673

Title: Resist composition with radiation sensitive acid generator

Abstract: The invention relates to a polymeric, radiation-sensitive resist composition comprising (i) iodonium sulfonate radiation sensitive acid generator; (ii) a polymer; and (iii) an acid labile compound.

Inventors: Breyta; Gregory (San Jose, CA), DiPietro; Richard Anthony (San Jose, CA), Hofer; Donald Clifford (San Martin, CA), Ito; Hiroshi (San Jose, CA), Allen; Robert David (San Jose, CA), Opitz; Juliann (San Jose, CA), Wallow; Thomas I. (Union City, CA)

Assignee: International Business Machines Corporation

International Classification: G03F 7/004 (20060101); G03F 7/039 (20060101); G03F 007/004 (); G03F 007/30 ()

Expiration Date: 12/26/2017