Patent Number: 6,165,674

Title: Polymers and photoresist compositions for short wavelength imaging

Abstract: The present invention provides novel polymers and photoresist compositions that comprise the polymers as a resin binder component. The photoresist compositions of the invention can provide highly resolved relief images upon exposure to extremely short wavelengths, including well-resolved 0.25 micron features imaged at 193 nm. Polymers of the invention include those that comprise a photogenerated acid-labile unit that includes a cyano moiety, as well as polymers that contain cyano and itaconic anhydride moieties in combination.

Inventors: Taylor; Gary N. (Marlborough, MA), Barclay; George G. (Allston, MA), Szmanda; Charles R. (Westborough, MA)

Assignee: Shipley Company, L.L.C.

International Classification: G03F 7/039 (20060101); G03F 007/004 ()

Expiration Date: 12/26/2017