Patent Number: 6,165,675

Title: Isolation of novolak resin by low temperature sub surface forced steam distillation

Abstract: A water insoluble, aqueous alkali soluble novolak resin, process for producing such a novolak resin, a photoresist containing such a novolak resin, and a method for producing a semiconductor device, wherein the resin is isolated by sub surface forced steam distillation.

Inventors: Rahman; M. Dalil (Flemington, NJ), Aubin; Daniel (Oxford, NJ)

Assignee: Clariant Finance (BVI) Limited

International Classification: C08L 61/00 (20060101); C08G 8/12 (20060101); C08L 61/06 (20060101); C08G 8/00 (20060101); C08G 8/24 (20060101); C08G 8/08 (20060101); G03F 7/023 (20060101); G03C 005/00 ()

Expiration Date: 12/26/2017