Patent Number: 6,165,677

Title: Photoresist composition

Abstract: A chemical amplifying type positive photoresist composition, excellent in various properties, and not form necking at the potion where the bottom antireflective coating and the resist film contact, which comprises (A) a resin which is converted to alkali-soluble from alkali-insoluble or alkali slightly soluble by the action of an acid, (B) an acid generator, (C) a tertiary amine compound and (D) a diphenyl sulfone compound, and a fine photoresist pattern can be formed in high precision using the photoresist composition.

Inventors: Yako; Yuko (Takatsuki, JP)

Assignee: Sumitomo Chemical Company, Limited

International Classification: G03F 7/004 (20060101); G03F 007/004 ()

Expiration Date: 12/26/2017