Patent Number: 6,165,684

Title: Bottom anti-reflective coating material composition and method for forming resist pattern using the same

Abstract: A composition for a bottom anti-reflective coating material and a method for forming a resist pattern using the composition, which are high in the dry etching rate, high in the resolution, excellent in the resist film thickness dependency and high in the effect of preventing reflective light against exposure light, and provide no intermixing with the photoresist layer, are disclosed, wherein the composition for a bottom anti-reflective coating material comprises a naphthalene group-containing polymer compound having a specific structure.

Inventors: Mizutani; Kazuyoshi (Shizuoka, JP), Momota; Makoto (Shizuoka, JP)

Assignee: Fuji Photo Film Co., Ltd.

International Classification: G03F 7/09 (20060101); G03F 007/11 ()

Expiration Date: 12/26/2013