Patent Number: 6,165,688

Title: Method of fabricating of structures by metastable atom impact desorption of a passivating layer

Abstract: A metastable depassivation lithography process for fabricating microstructures on a surface which utilizes the energy contained in neutral metastable rare gas atoms to remove passivating atoms from selected areas of a surface. Removal of the passivating atoms in a pattern allows further chemical processing to add or remove material to the exposed areas. The neutral metastable rare gas atoms can be directed to the surface using atom optical techniques to effect a desired pattern of exposure by the atoms. Alternatively, a mask can be used to effect a desired pattern of exposure.

Inventors: Celotta; Robert J. (Darnestown, MD), McClelland; Jabez J. (Bethesda, MD), Gupta; Rajeev (Gaithersburg, MD), Craighead; Harold (Ithaca, NY)

Assignee: The United States of America, as represented by the Secretary of Commerce

International Classification: G03F 1/00 (20060101); G03F 7/20 (20060101); H05H 3/02 (20060101); H05H 3/00 (20060101); G03F 007/00 ()

Expiration Date: 12/26/2017