Patent Number: 6,166,386

Title: Micro-processing method using a probe

Abstract: A micro-processing method is provided for forming a structure adapted to confine electrons within a micro-region. The method comprises steps of arranging a probe oppositely relative to a non-electroconductive thin film arranged on an electroconductive substrate, placing the probe on or near the surface to be processed of the non-electroconductive thin film, applying a voltage between the probe and the substrate to form an enhanced electroconductivity region as compared with the remaining area in the non-electroconductive thin film, and oxidizing the interface of the substrate and the non-electroconductive thin film.

Inventors: Yano; Koji (Zama, JP), Kuroda; Ryo (Kawasaki, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: H01J 37/317 (20060101); H01L 21/00 (20060101); H01L 021/00 (); H01J 037/317 ()

Expiration Date: 12/26/2013