Patent Number: 6,166,801

Title: Monitoring apparatus and method particularly useful in photolithographically processing substrates

Abstract: Apparatus for processing substrates according to a predetermined photolithography process includes a loading station in which the substrates are loaded, a coating station in which the substrates are coated with a photoresist material, an exposing station in which the photoresist coating is exposed to light through a mask having a predetermined pattern to produce a latent image of the mask on the photoresist coating, a developing station in which the latent image is developed, an unloading station in which the substrates are unloaded and a monitoring station for monitoring the substrates with respect to predetermined parameters of said photolithography process before reaching the unloading station.

Inventors: Dishon; Giora (Jerusalem, IL), Finarov; Moshe (Rehovot, IL), Cohen; Yoel (Ness Ziona, IL), Nirel; Zvi (Mevasseret Zion, IL)

Assignee: Nova Measuring Instruments, Ltd.

International Classification: G03F 7/20 (20060101); G03B 027/32 (); H01L 021/66 (); G01B 009/02 ()

Expiration Date: 12/26/2017