Patent Number: 6,166,820

Title: Laser interferometric lithographic system providing automatic change of fringe spacing

Abstract: An interferometric lithographic apparatus includes an arrangement for applying interfering laser beams to a part for producing a first interference pattern. The first interference pattern has a first fringe spacing. A mobile part holder stage is repositioned to change the interference pattern and produce a second fringe spacing. A control arrangement, automatically responsive to the repositioning of the part holder, re-aligns optical paths and optimally interferes the laser beams to produce the second fringe spacing.

Inventors: Ghosh; Amalkumar P. (Poughkeepsie, NY), Schwartz Jones; Susan K. (Lagrangeville, NY), Jones; Gary W. (Lagrangeville, NY), Zimmerman; Steven M. (Pleasant Valley, NY), Liu; Yachin (Poughkeepsie, NY)

Assignee: eMagin Corporation

International Classification: G03F 7/00 (20060101); G03F 7/20 (20060101); G01B 009/02 ()

Expiration Date: 12/26/2017