Patent Number: 6,166,854

Title: Diffraction type filter having an aberration correction function and wave length selectivity

Abstract: A zone plate having an aberration correcting function in a wavelength selecting manner and a diffraction grating substantially having a light shielding function in a wavelength selecting manner are formed, respectively, in a center region and a marginal region of a filter, whereby only a predetermined wavelength of light is converged or diverged by the zone plate and is diffracted sideways by the diffraction grating, whereby the luminous flux diameter of the irradiation light is changed while the aberration caused by a convergent lens is favorably corrected. The diffraction type filter 8A is constituted by a first region 11 comprising a central circular portion and a second region 12 comprising a marginal portion thereof. The first region 11 is provided with a zone plate 11A (diffraction grating formed like concentric circles) having such a wavelength selectivity that light at a wavelength of 635 nm is transmitted therethrough as it is and that light at a wavelength of 780 nm is converged thereby. The second region 12 is provided with a diffraction grating 12A having such a wavelength selectivity that light at a wavelength of 635 nm is transmitted therethrough as it is and that a major part of light at a wavelength of 780 nm is diffracted sideways so as to be substantially blocked out.

Inventors: Katsuma; Toshiaki (Omiya, JP)

Assignee: Fuji Photo Optical Co., Ltd.

International Classification: G11B 7/125 (20060101); G11B 7/135 (20060101); G11B 7/00 (20060101); G02B 005/18 (); G02B 027/44 (); G11B 007/00 ()

Expiration Date: 12/26/2017