Patent Number: 6,166,865

Title: Projection optical system and exposure apparatus

Abstract: A projection optical system for projecting an image of a reticle onto a wafer wherein the first optical element in the projection optical system is a deformable mirror. The deformable mirror deforms into a surface having an aspherical shape. The projection optical system has a reduction ratio in the range of -1/8X to -1/20X.

Inventors: Matsuyama; Tomoyuki (Tokyo, JP)

Assignee: Nikon Corporation

International Classification: G02B 27/00 (20060101); G02B 26/08 (20060101); G03F 7/20 (20060101); G02B 015/14 ()

Expiration Date: 12/26/2017