Patent Number: 6,167,323

Title: Method and system for controlling gas system

Abstract: Flow sensors 41 and 42 for detecting a flow load including the presence of a flow of gas are provided in supply lines 2a through 2d for supplying a given gas into a treatment chamber 6. A CPU 40 is provided for previously storing control parameters corresponding to the presence of a flow of gas. The presence of a flow of gas or a flow of IPA is detected by the flow sensors 41, 42 or an IPA supply pump 43, and detected signals are transmitted to the CPU 40. On the basis of a control signal outputted from the CPU 40, a cartridge heater 14, inner and outer tube heaters 25 and 26 and an insulation heater 52 are controlled. Thus, a control parameter adopted in accordance with the presence of a flow of gas to be used is determined, so that the control parameter previously stored in a data table 100 is selected in accordance with a control mode to control the temperature or pressure of the gas.

Inventors: Komino; Mitsuaki (Tokyo-To, JP), Uchisawa; Osamu (Sendai, JP), Chiba; Yasuhiro (Sendai, JP)

Assignee: Tokyo Electron Limited

International Classification: C23C 16/455 (20060101); C23C 16/52 (20060101); H01L 21/00 (20060101); G05D 023/00 ()

Expiration Date: 12/26/2017