Patent Number: 6,168,669

Title: Substrate holding apparatus and substrate process system

Abstract: Supporting members are provided at three places, for example, on a frame section of a pair of tweezers. Each supporting member has a tapered face as an inclined guide for allowing a rim portion of a substrate to slide down to be guided to a predetermined position. A vertical wall which is formed continuing from the tapered face and being nearly perpendicular to a supported face of a wafer is provided at an upper end of the tapered face. Even when the rim portion of the wafer rises along the tapered face with the movement of the tweezers, the rim portion stops by hitting against the vertical wall, thereby preventing the wafer from falling from the tweezers.

Inventors: Yasuda; Kenji (Kumamoto, JP), Iida; Naruaki (Kumamoto, JP)

Assignee: Tokyo Electron Limited

International Classification: H01L 21/67 (20060101); H01L 21/687 (20060101); C23C 016/00 ()

Expiration Date: 01/02/2018