Patent Number: 6,168,737

Title: Method of casting patterned dielectric structures

Abstract: A pattern of dielectric structures are formed directly on a substrate in a single step using sol-gel chemistry and molding procedures. The resulting dielectric structures are useful in vacuum applications for electronic devices. Porous, lightweight structures having a high aspect ratio that are suitable for use as spacers between the faceplate and baseplate of a field emission display can be manufactured using this method.

Inventors: Poco; John F. (Livermore, CA), Hrubesh; Lawrence W. (Livermore, CA)

Assignee: The Regents of the University of California

International Classification: B29C 39/10 (20060101); B29C 33/38 (20060101); H01J 9/18 (20060101); B29C 33/00 (20060101); B29C 37/00 (20060101); B29C 039/02 (); H01J 009/00 ()

Expiration Date: 01/02/2018