Patent Number: 6,169,602

Title: Inspection method and apparatus for projection optical systems

Abstract: The present invention relates to a method of detecting an image formation characteristic of a projection optical system for projecting a reference pattern on a reticle on a substrate. According to the detection method, a reticle stage is moved so that a reference mark on the reticle comes to a first reference position and a second reference position, and a wafer stage is moved so that a light transmission portion on the wafer stage crosses an image forming position of a projected image of the reference mark obtained through the projection optical system. The positions of the reticle stage and the wafer stage at the first and second reference positions are measured as moved distances of the stages, respectively. From the distances of movement of the reticle and wafer stages measured, the image formation characteristic of the projection optical system is calculated.

Inventors: Taniguchi; Tetsuo (Kanagawa-ken, JP), Tsuji; Toshihiko (Chiba-ken, JP)

Assignee: Nikon Corporation

International Classification: G03F 7/20 (20060101); G01B 011/00 ()

Expiration Date: 01/02/2018