Patent Number: 6,170,430

Title: Gas feedthrough with electrostatic discharge characteristic

Abstract: A gas feedthrough in a semiconductor processing apparatus comprises a static-dissipative composite material. This material is characterized by good resistance to electromigration and is preferably made of a homogeneous material. This apparatus for preventing the transfer of energy to a gas flown through a gas line and comprises a gas feedthrough comprising a static-dissipative material, the feedthrough having a first end for abuttingly contacting an electrically energized member and a second end for contacting a grounded member, the feedthrough defining a void therein along its length to house a gas line.

Inventors: Liu; Kuo-Shih (Milpitas, CA), Cheung; Ernest (Cupertino, CA), Kumar; Prasanth (Fremont, CA), Ferguson; John (Oakland, CA), Friebe; Michael G. (Santa Clara, CA), Shrotriya; Ashish (Santa Clara, CA), Taylor, Jr.; William Nixon (Dublin, CA)

Assignee: Applied Materials, Inc.

International Classification: C23C 16/455 (20060101); H01J 37/32 (20060101); C23C 016/00 (); H05H 001/00 ()

Expiration Date: 01/09/2018