Patent Number: 6,170,431

Title: Plasma reactor with a deposition shield

Abstract: A reactor 20 includes a shield 50 which prevents the deposition of materials along a line-of-sight path from a wafer 26 toward and onto an electrode 32, or a window 38 which couples an electrode 32 to a reaction chamber of the reactor 20. The shield can be comprised of a conductor and/or an insulator. The shield can affect the character of a plasma generated in the reactor.

Inventors: DeOrnellas; Stephen P. (Santa Rosa, CA), Ditizio; Robert A. (Petaluma, CA)

Assignee: Tegal Corporation

International Classification: C23C 14/56 (20060101); H01J 37/32 (20060101); C23C 016/00 (); H05H 001/00 ()

Expiration Date: 01/09/2018