Patent Number: 6,183,523

Title: Apparatus for thermal control of variously sized articles in vacuum

Abstract: A substrate support platform has a substrate engaging surface which defines a first channel for introducing and distributing a thermal transfer gas to a first region of the engaging surface, and a second channel, nonintersecting with the first channel, for introducing and distributing a thermal transfer gas to a second region of the engaging surface. A gas delivery system is independently connected between a gas source and the first and second channels, for independently providing (via valved connections) a thermal transfer gas to the first and second channels, so that gas delivery may be limited to one of the channels, or gas may be delivered to both of the channels in case a substrate is placed over either or both of the associated regions. A pressure measuring device is independently coupled to each of the channels via measuring ports, permitting measurement and control of gas pressure from the gas source.

Inventors: Hurwitt; Steven (late of Park Ridge, NJ), Reiss; Ira (New City, NY)

Assignee: Tokyo Electron Limited

International Classification: H01L 21/67 (20060101); H01L 21/00 (20060101); H01L 21/687 (20060101); H01L 021/00 (); H01L 021/64 (); H01J 003/26 (); H01J 003/14 ()

Expiration Date: 02/06/2018