Patent Number: 6,183,652

Title: Method for removing microorganism contamination from a polishing slurry

Abstract: A method for removing microorganism contamination from a polishing slurry used for chemical mechanical polishing operations in the semiconductor manufacturing industry includes treating a slurry stream with ultraviolet (uv) energy to destroy the microorganisms, then filtering the uv-treated stream to remove the destroyed microorganisms before the slurry is delivered to the polishing apparatus.

Inventors: Crevasse; Annette Margaret (Apopka, FL), Easter; William Graham (Orlando, FL), Maze; John Albert (Orlando, FL), Miceli; Frank (Orlando, FL)

Assignee:

International Classification: C02F 1/32 (20060101); C02F 001/48 ()

Expiration Date: 02/06/2013