Patent Number: 6,200,724

Title: Chemical amplification resist compositions and process for the formation ofresist patterns

Abstract: A novel chemical amplification resist composition which comprises an alkali-soluble base resin, a photoacid generator and a dissolution inhibitor and in which a cyclic or acyclic structure constituting a matrix portion of the molecule of said dissolution inhibitor contains at least one lone pair-containing portion which can provide a hydrogen bond sufficient to shift and gather an alkali-soluble moiety of said base resin to and on a side of said molecule of the dissolution inhibitor compound. The resist composition can exhibit both excellent sensitivity and resolution and accordingly can be utilized in the formation of very fine resist patterns in a lithographic process. A method for forming such resist patterns is also disclosed.

Inventors: Namiki; Takahisa (Kawasaki, JP), Yano; Ei (Kawasaki, JP), Watanabe; Keiji (Kawasaki, JP), Nozaki; Koji (Kawasaki, JP), Igarashi; Miwa (Kawasaki, JP), Kuramitsu; Yoko (Kawasaki, JP)


International Classification: G03F 7/004 (20060101); G03F 7/039 (20060101); G03C 001/73 ()

Expiration Date: 03/12013