Patent Number: 6,250,822

Title: Semiconductor wafer manufacturing method and apparatus for an improved heat exchanger for a photoresist developer

Abstract: Embodiments of the invention comprise a new device and technique to realize an improved temperature control for a chemical photoresist developer utilizing a preexisting integrated single reservoir. This improvement is achieved by providing for a modified temperature control unit and procedure. The temperature control unit preferably comprises a plurality of heat exchanger conduits that are each supplied by an inlet manifold, and then exhausted via an outlet manifold. The temperature control unit preferably extends fully within the modified nozzle unit. By utilizing the improved temperature control unit, a first and second volumetric allocation of developer may be issued so that both may be dispensed within a relatively short period of time upon a photoresist layer surface in a temperature controlled state.

Inventors: Wakamiya; Ted (San Ramon, CA), Kent; Eric (San Jose, CA), Marinaro; Vincent L. (Sunnyvale, CA)

Assignee: Advanced Micro Device, Inc.

International Classification: B05C 5/00 (20060101); G03F 7/30 (20060101); H01L 21/00 (20060101); B05C 11/08 (20060101); G03D 005/00 (); G03D 013/00 ()

Expiration Date: 06/26/2018