Patent Number: 6,251,191

Title: Processing apparatus and processing system

Abstract: One of the disclosed processing apparatus includes a processing vessel having an inner processing space defined by a ceiling portion, a bottom portion, and side walls and capable of being evacuated to a predetermined vacuum, a mounting table which has a first mounting surface for mounting the object thereon and a second mounting surface facing an opposite side to which the first mounting surface faces, which is supported by the ceiling portion of the processing vessel, and which extends toward the bottom portion of the processing vessel in such a way that the first and second mounting surfaces face the side walls of the processing vessel, a process gas supply mechanism, for supplying a process gas to the inner processing space, and a loading/unloading portion having an opening formed in the bottom portion of the processing vessel and an open/close device for opening/closing the opening, for loading/unloading the object into/from the processing vessel.

Inventors: Matsuse; Kimihiro (Inagi, JP)

Assignee: Tokyo Electron Limited

International Classification: C23C 16/54 (20060101); H01L 21/00 (20060101); C23C 016/00 ()

Expiration Date: 06/26/2018