Patent Number: 6,251,217

Title: Reticle adapter for a reactive ion etch system

Abstract: A reticle adapter that is capable of supporting a reticle in a conventional reactive ion etch chamber that is designed for etching circular silicon wafers. The adapter has a lower portion that is milled to cover the upper portion of a pedestal within a reactive ion etch chamber. A top portion of the adapter has an opening that is sized and shaped to hold a reticle.

Inventors: Ye; Yan (Saratoga, CA), Plavidal; Richard W. (Los Gatos, CA)

Assignee: Applied Materials, Inc.

International Classification: H01L 21/683 (20060101); H01L 21/67 (20060101); H01L 21/00 (20060101); H01L 021/00 (); C23C 016/00 ()

Expiration Date: 06/26/2018