Patent Number: 6,251,218

Title: Ion beam processing apparatus

Abstract: The invention aims at reducing the movement of an operator to improve the operability. A vacuum chamber door is provided on the front side of a vacuum chamber, and sample holders are connected to the vacuum chamber door through a rotation shaft and a disk. An ion source is detachably mounted on the right side of the vacuum chamber, and a control panel is provided on the left side of the vacuum chamber. The vacuum chamber door is supported by a linearly reciprocally-moving mechanism so as to be drawn away from the vacuum chamber. An operation surface of the vacuum chamber door and an operation surface of the control panel are disposed substantially in a common plane.

Inventors: Fujisawa; Tatsuya (Hitachi, JP), Ooishi; Shotaro (Hitachi, JP), Oonuki; Hisao (Hitachiota, JP), Hashimoto; Isao (Hitachi, JP)

Assignee: Hitachi, Ltd.

International Classification: H01J 37/16 (20060101); H01L 21/67 (20060101); H01L 21/677 (20060101); H01J 37/02 (20060101); C23F 001/02 ()

Expiration Date: 06/26/2018