Patent Number: 6,251,543

Title: Process for fabricating a projection electron lithography mask and a removable reusable cover for use therein

Abstract: A removable, reusable cover constructed such that its geometry matches the geometry of the active region of a projection electron lithography mask to be protected and does not etch in the plasma environment used to remove a photoresist. The cover protects the active region of the projection electron lithography mask, but does not contact the active region. A technique for fabricating a projection electron lithography mask utilizing the removable, reusable cover, where the geometry of the cover is matched to the geometry of an active region of the projection electron lithography mask to be protected. During fabrication of the projection electron lithography mask, the cover protects the active region of the projection electron lithography mask from the plasma environment, but does not contact the active region.

Inventors: Caminos; Carlos G. (Lyndhurst, NJ), Knurek; Chester S. (Linden, NJ), Novembre; Anthony E. (Martinsville, NJ)

Assignee: Agere Systems Guardian Corp.

International Classification: G03F 1/14 (20060101); G03F 009/00 ()

Expiration Date: 06/26/2018