Patent Number: 6,251,545

Title: Method and system for improving transmission of light through photomasks

Abstract: The present invention provides a method and system for improving the transmission of light through a photomask. The method includes providing a photomask substrate, and applying at least one anti-reflection coating to at least one side of the photomask substrate. The anti-reflection coating reduces the loss of light during lithography due to reflections. This increases the efficiency of the lithography. The method and system has the added advantage of reducing the amount of undesired exposure of a photoresist.

Inventors: Levinson; Harry J. (Saratoga, CA)

Assignee: Advanced Micro Devices, Inc.

International Classification: G03F 1/14 (20060101); G03F 1/00 (20060101); G03F 009/00 ()

Expiration Date: 06/26/2018