Patent Number: 6,251,558

Title: Chemically amplified resist

Abstract: A chemically amplified resist contains the following components: a polymer with carboxylic acid anhydride groups and tert-butylester, tert-butoxycarbonyloxy, tetrahydrofuranyl, or tetrahydropyranyl groups; a photoreactive compound which, when exposed or electron-irradiated, releases a sulfonic acid having a pK.sub.a value>0.5 (acid former); a compound that can enter into a reversible chemical reaction with the sulfonic acid (buffer compound); and a solvent.

Inventors: Elian; Klaus (Erlangen, DE), Leuschner; Rainer (Grossenseebach, DE), Guenther; Ewald (Herzogenaurach, DE)

Assignee: Siemens Aktiengesellschaft

International Classification: G03F 7/004 (20060101); G03F 7/039 (20060101); G06F 007/004 (); G03C 005/00 ()

Expiration Date: 06/26/2018