Patent Number: 6,251,560

Title: Photoresist compositions with cyclic olefin polymers having lactone moiety

Abstract: Acid-catalyzed positive photoresist compositions which are imageable with 193 nm radiation (and possibly other radiation) and are developable to form photoresist structures of improved development characteristics and improved etch resistance are enabled by the use of resist compositions containing cyclic olefin polymer having a cyclic olefin monomer having a lactone moiety, the monomer having no oxygen atoms intervening between the lactone moiety and a ring of the cyclic olefin. Preferred lactone moieties are spirolactones (having a 5 or 6 membered ring) directly to a cyclic olefin ring.

Inventors: Wallow; Thomas I. (Union City, CA), Allen; Robert D. (San Jose, CA), Brock; Phillip Joe (Sunnyvale, CA), DiPietro; Richard Anthony (San Jose, CA), Ito; Hiroshi (San Jose, CA), Truong; Hoa Dao (San Jose, CA), Varanasi; Pushkara Rao (Poughkeepsie, NY)

Assignee: International Business Machines Corporation

International Classification: G03F 7/004 (20060101); G03F 7/039 (20060101); B03F 007/004 ()

Expiration Date: 06/26/2018