Patent Number: 6,251,569

Title: Forming a pattern of a negative photoresist

Abstract: A new group of non-chemically amplified negative tone water/aqueous base developable (photo) resists based on redistribution of carbon-oxygen bonds in pendant ester groups of the polymers has been found.

Inventors: Angelopoulos; Marie (Cortlandt Manor, NY), Babich; Edward D. (Chappaqua, NY), Babich; Inna V. (Chappaqua, NY), Babich; Katherina E. (Chappaqua, NY), Bucchignano; James J. (Yorktown, NY), Petrillo; Karen E. (Mahopac, NY), Rishton; Steven A. (Hayward, CA)

Assignee: International Business Machines Corporation

International Classification: G03F 7/038 (20060101); G03F 7/075 (20060101); G03F 007/30 (); G03F 007/004 ()

Expiration Date: 06/26/2018