Patent Number: 6,252,238

Title: Micro-processing method using a probe

Abstract: An electroconductive micro-region surrounded by a non-electroconductive region is formed on a non-electroconductive substrate surface. Such an electroconductive micro-region is formed by forming a non-electroconductive thin film on a non-electroconductive substrate surface, then approximating a probe having a micro-aperture for irradiation of light to the spot to be processed of the non-electroconductive thin film, and irradiating the non-electroconductive thin film with light through the micro-aperture of the probe to thereby increasing the electroconductivity of the non-electroconductive thin film at the spot. The electroconductive micro-region can be formed so that it confines electrons to exhibit quantum effects.

Inventors: Yano; Koji (Zama, JP), Kuroda; Ryo (Kawasaki, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: B82B 3/00 (20060101); G03F 7/20 (20060101); G12B 21/06 (20060101); G12B 21/00 (20060101); A61N 005/00 (); G21G 005/00 ()

Expiration Date: 06/26/2018