Patent Number: 6,252,665

Title: Lithography using quantum entangled particles

Abstract: A system of etching using quantum entangled particles to get shorter interference fringes. An interferometer is used to obtain an interference fringe. N entangled photons are input to the interferometer. This reduces the distance between interference fringes by n, where again n is the number of entangled photons.

Inventors: Williams; Colin (Pasadena, CA), Dowling; Jonathan (Pasadena, CA)

Assignee: California Institute of Technology

International Classification: G03F 7/00 (20060101); G03F 7/20 (20060101); G01B 009/02 ()

Expiration Date: 06/26/2018