Patent Number: 6,254,398

Title: Method for initiating a helium alarm particle detector in a dry etching system prior to initiation of the etching process

Abstract: A process for determining particles in a dry etching system, prior to performing the dry etching definition of a desired pattern, has been developed. The process features a two cycle, dry etching procedure, with the first cycle performed using a first set of dry etching conditions, not robust enough to result in etching of exposed material, but robust enough do allow the activation, and operation, of a backside helium alarm procedure, used to monitor particle count in the dry etching chamber, to be realized. If particle counts are acceptable a second cycle of the dry etching procedure, using a second set of dry etching conditions, is employed to define the desired pattern. If the particle counts observed via use of the backside helium alarm procedure during the non-etching, first cycle, are high, the dry etching procedure is interrupted. After cleanup of the dry etching chamber, the same samples, with a re-worked photoresist, are again subjected to the two cycle, dry etching procedure.

Inventors: Chen; Horng-Wen (Taichung, TW)

Assignee: Taiwan Semiconductor Manufacturing Company

International Classification: H01L 21/02 (20060101); H01J 37/32 (20060101); H01L 21/3213 (20060101); H01L 021/00 ()

Expiration Date: 07/03/2018