Patent Number: 6,254,463

Title: Chemical planar head dampening system

Abstract: An improved polishing apparatus having a dampening system to prevent fluctuations between the planar head polishing device and the circuit panel. The dampening system includes a load actuation arm having a hydraulic-pneumatic cylinder which is controlled by an connected dampening circuit.

Inventors: Case; James R. (Brackney, PA), Kiballa; Gerald A. (Owego, NY), Shuman; Michael A. (Rome, PA)

Assignee: International Business Machines Corporation

International Classification: B23Q 11/00 (20060101); B24B 41/00 (20060101); B24B 37/04 (20060101); B24D 13/00 (20060101); B24D 13/02 (20060101); F16F 15/027 (20060101); F16F 15/023 (20060101); H05K 3/26 (20060101); B24B 021/04 ()

Expiration Date: 07/03/2018