Patent Number: 6,254,689

Title: System and method for flash photolysis cleaning of a semiconductor processing chamber

Abstract: A method for flash photolysis cleaning are used to remove photoresist contamination from semiconductor processing chambers. During semiconductor processing, such as etching and stripping, photoresist contamination deposits on the surfaces inside the processing chamber. As more and more semiconductor wafers are processed, the photoresist contamination accumulates and this buildup on the surfaces inside the chamber is the source of particulate contaminants which are damaging to the semiconductor devices processed in the chamber. By using ultraviolet radiation (UV), a reactive agent is generated from the incoming gas flow concurrently with the preferential heating of the photoresist contamination. By flowing oxygen into the semiconductor processing chamber and exposing the oxygen to UV, the highly reactive agent ozone is produced. The reactive agent reacts with the heated photoresist to produce volatile products that are removed from the chamber in the exiting gas flow. A detector is used downstream to determine when sufficient cleaning has occurred and the cleaning process is complete.

Inventors: Meder; Martin G. (Catasauqua, PA)

Assignee: Lucent Technologies Inc.

International Classification: G03F 7/42 (20060101); B08B 007/00 ()

Expiration Date: 07/03/2018