Patent Number: 6,254,737

Title: Active shield for generating a plasma for sputtering

Abstract: A combination coil and shield for a plasma chamber in a semiconductor fabrication system is provided. The coil-shield has a plurality of turns to couple energy efficiently into a plasma and also substantially blocks deposition material from reaching a second shield positioned behind the first shield.

Inventors: Edelstein; Sergio (Los Gatos, CA), Subramani; Mani (San Jose, CA)

Assignee: Applied Materials, Inc.

International Classification: H01J 37/32 (20060101); H01J 37/34 (20060101); C23C 014/34 ()

Expiration Date: 07/03/2018