Patent Number: 6,254,739

Title: Pre-treatment for salicide process

Abstract: A method for treating a silicon substrate is described. The silicon substrate is placed into a sputtering equipment. A sputtering step is performed to simultaneously dry clean and amorphize the silicon substrate surface by using the sputtering equipment. A titanium film is deposited on the silicon substrate by the sputtering equipment.

Inventors: Fan; Su-Chen (Taoyuan Hsien, TW)

Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.

International Classification: C23C 14/02 (20060101); C23C 14/16 (20060101); C23C 014/34 ()

Expiration Date: 07/03/2018