Patent Number: 6,254,760

Title: Electro-chemical deposition system and method

Abstract: The present invention generally provides an electro-chemical deposition system that is designed with a flexible architecture that is expandable to accommodate future designs rules and gap fill requirements and provides satisfactory throughput to meet the demands of other processing systems. The electro-chemical deposition system generally comprises a front-end loading station, a mainframe including one or more processing cells, and an electrolyte replenishing system fluidly connected to the one or more electrical processing cells. The electrolyte replenishing system comprises a main electrolyte supply tank and an analyzer module and dosing module coupled thereto. The analyzer module includes one or more chemical analyzers to monitor the concentrations of various chemicals in the main electrolyte supply tank. Information provided by the analyzer module is transmitted via a central control system to the dosing module. Source tanks in the dosing module communicate with the main supply tank to deliver the desired proportions of chemicals thereto. Preferably, the electrolyte analysis is performed continuously during processing to provide real-time data and electrolyte adjustments.

Inventors: Shen; Ben (San Jose, CA), Dordi; Yezdi (Palo Alto, CA), Birkmaier; George (Cupertino, CA)

Assignee: Applied Materials, Inc.

International Classification: C25D 7/12 (20060101); H01L 21/02 (20060101); H01L 21/288 (20060101); H05K 3/24 (20060101); G01F 001/64 (); G01N 017/00 (); C25B 015/00 (); C25D 017/00 (); C25D 021/12 ()

Expiration Date: 07/03/2018