Patent Number: 6,254,796

Title: Selective etching of silicate

Abstract: A silicate glass is selectively etched employing a composition containing a fluoride containing compound and certain organic solvents. Preferred compositions also include water.

Inventors: Rath; David L. (Stormville, NY), Gale; Glenn W. (Austin, TX), Jagannathan; Rangarajan (Essex Junction, VT), McCullough; Kenneth J. (Fishkill, NY), Madden; Karen P. (Poughquag, NY), Okorn-Schmidt; Harald F. (Putnam Valley, NY), Pope; Keith R. (Danbury, CT)

Assignee: International Business Machines Corporation

International Classification: C03C 15/00 (20060101); C09K 13/00 (20060101); C09K 13/08 (20060101); H01L 21/02 (20060101); H01L 21/311 (20060101); H01L 021/302 (); B44C 001/22 ()

Expiration Date: 07/03/2018