Patent Number: 6,254,935

Title: Method for applying a barrier layer to a silicon based substrate

Abstract: A method for applying a barrier layer which comprises a barium-strontium aluminosilicate to a silicon containing substrate which inhibits the formation of cracks.

Inventors: Eaton; Harry E. (Woodstock, CT), Lawton; Thomas H. (Wethersfield, CT)

Assignee: United Technologies Corporation

International Classification: C04B 41/50 (20060101); C04B 41/89 (20060101); C04B 41/52 (20060101); C04B 41/85 (20060101); C04B 41/45 (20060101); C23C 4/10 (20060101); C23C 4/18 (20060101); C23C 4/02 (20060101); C23C 28/00 (20060101); F01D 5/28 (20060101); B05D 003/02 (); B05D 001/38 (); C23C 004/02 (); C23C 004/10 ()

Expiration Date: 07/03/2018