Patent Number: 6,254,936

Title: Environment exchange control for material on a wafer surface

Abstract: Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber. A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity).

Inventors: Gurer; Emir (Scotts Valley, CA), Lee; Ed C. (Cupertino, CA), Zhong; Tom (Santa Clara, CA), Golden; Kevin (Wallkill, NY), Lewellen; John W. (San Jose, CA), Reynolds; Reese (Los Gatos, CA), Wackerman; Scott C. (Mountain View, CA)

Assignee: Silicon Valley Group, Inc.

International Classification: G03F 7/38 (20060101); G03F 7/26 (20060101); G03F 7/20 (20060101); G03F 7/16 (20060101); B05D 003/00 ()

Expiration Date: 07/03/2018