Patent Number: 6,255,193

Title: Method for fabricating an isolation trench using an auxiliary layer

Abstract: The fabrication method provides for an etched isolation trench to be lined, if appropriate firstly with a thin thermal oxide layer, and then with an oxidizable auxiliary layer. The auxiliary layer consumes oxygen during subsequent thermal processes, thereby avoiding oxidation of deeper structures, in particular of an insulation collar in a capacitor trench.

Inventors: Sperlich; Hans-Peter (Dresden, DE), Zimmermann; Jens (Dresden, DE)

Assignee: Infineon Technologies AG

International Classification: H01L 21/762 (20060101); H01L 21/70 (20060101); H01L 21/763 (20060101); H01L 21/8242 (20060101); H01L 021/70 ()

Expiration Date: 07/03/2018