Patent Number: 6,255,197

Title: Hydrogen annealing method and apparatus

Abstract: A processing method includes providing a first gas including a hydrogen atom into a first chamber, igniting a plasma within the first chamber to provide a source of hydrogen atoms, passing the plasma downstream through a cavity to a second chamber disposed separately from the first chamber, and heating an object disposed within the second chamber.

Inventors: Fujimura; Shuzo (Chiba, JP), Takamatsu; Toshiyuki (Chiba, JP)

Assignee: Mitzel; Jim

International Classification: H01L 21/02 (20060101); H01L 21/30 (20060101); H01L 21/324 (20060101); H01L 21/28 (20060101); H01L 021/322 ()

Expiration Date: 07/03/2018