Patent Number: 6,255,220

Title: Method and apparatus for plasma control

Abstract: The present invention provides a method for plasma control, in which an electric field is generated in the direction perpendicular to the surface of an object to be processed in plasma atmosphere generated in a processing chamber and another electric field is generated in the direction parallel to the surface, and the direction of ion or electron in plasma atmosphere is controlled by controlling the composite electric field composed of both the electric fields. The invention provides also an apparatus for plasma control provided with a perpendicular electric field generating means for generating an electric field in the direction perpendicular to the surface of the object, and a parallel electric field generating means for generating an electric field in the direction parallel to the surface of the object.

Inventors: Kisakibaru; Toshiro (Kanagawa, JP), Kojima; Akira (Oita, JP), Kato; Yasushi (Kanagawa, JP), Honbori; Isao (Kanagawa, JP), Bannai; Satoshi (Kanagawa, JP), Chiba; Tomohiro (Kanagawa, JP), Kawashima; Toshitaka (Kanagawa, JP)

Assignee: Sony Corporation

International Classification: H01J 37/32 (20060101); H01L 021/302 (); H01L 021/461 ()

Expiration Date: 07/03/2018