Patent Number: 6,255,266

Title: Alkyldione peroxides as cleaning solutions for wafer fabs

Abstract: A method of cleaning elemental copper, cobalt, or nickel from the surface of equipment hardware without corroding or damaging the equipment parts and surfaces in the event of wafer breakage and non-wafer breakage is described. A solution comprising an alkyldione peroxide, a stabilizing agent, and alcohols is used to oxidize the metal and form soluble complexes which are removed by the cleaning solution. Also, a novel alkyldione peroxide solution for cleaning elemental copper, cobalt, or nickel from the surface of equipment hardware in the event of wafer breakage and non-wafer breakage is provided.

Inventors: Gupta; Subhash (Singapore, SG), I; Simon Choo (Singapore, SG), Zhou; Mei Sheng (Singapore, SG), Ho; Paul (Singapore, SG)

Assignee: Chartered Semiconductor Manufacturing Ltd.

International Classification: C11D 3/39 (20060101); C23G 5/00 (20060101); C11D 3/20 (20060101); C23G 5/032 (20060101); C11D 009/04 (); C11D 003/00 (); C11D 007/18 (); C03C 023/00 ()

Expiration Date: 07/03/2018