Patent Number: 6,293,222

Title: Remote-plasma-CVD method for coating or for treating large-surface substrates and apparatus for performing same

Abstract: The apparatus for coating or treating a substrate in a remote plasma CVD process includes a reaction chamber for the substrate; modular plasma source devices for exciting an excitation gas, preferably with microwaves, to form a plasma in the excitation gas arranged, either in a linear arrangement or in a two-dimensional planar array, over the substrate; devices for conducting a reactant gas over the substrate in the reaction chamber and for mixing the excitation gas containing the plasma with the reactant gas in the reaction chamber in the presence of the substrate and a device for removing exhaust gas from the reaction chamber. A device is provided for moving the substrate relative to the plasma source devices in a motion direction at an angle to the long axis of the arrangement or array of plasma source devices to minimize edge effects.

Inventors: Paquet; Volker (Mainz, DE)

Assignee: Schott Glaswerke

International Classification: C23C 16/50 (20060101); C23C 16/511 (20060101); C23C 16/54 (20060101); C23C 16/452 (20060101); C23C 16/448 (20060101); H01J 37/32 (20060101); C23C 016/00 (); H05H 001/00 ()

Expiration Date: 09/25/2018