Patent Number: 6,293,310

Title: Gas panel

Abstract: A gas panel for use with a tool for manufacturing a semiconductor includes a one-piece manifold body having an inlet for receiving a process gas. The manifold body has at least one lateral wall extending in the general direction of gas flow. The lateral wall includes at least one active device site having an active device thereon. The active device is in gas communication with a gas carrying path formed within the one-piece manifold. The active device may be a manual valve, a pneumatic valve, a pressure regulator, a pressure transducer, a purifier, a filter or a flow controller. The gas is received from the active device at a continuation of the gas flow path in the manifold body and is conveyed to a manifold outlet for ultimate to the tool.

Inventors: Redemann; Eric J. (Laguna Niguel, CA), Vu; Kim N. (Yorba Linda, CA)

Assignee: Unit Instruments, Inc.

International Classification: C23C 16/44 (20060101); C23C 16/455 (20060101); H01J 37/32 (20060101); H01L 21/00 (20060101); F16K 011/10 ()

Expiration Date: 09/25/2018